CPEM Plus functionality released

Correlative microscopy imaging performed by LiteScope via CPEM technology consists in the simultaneous acquisition of images by both AFM and SEM devices. The electron beam points steadily close to the AFM tip, while the sample provides the scanning motion. In this way is build correlated multilayer image by the AFM-in-SEM LiteScope. Layers recorded by the AFM tip have a slight offset from layers recorded by SEM detectors because the beam can't be aimed directly at the point of contact between the sample and the AFM tip.

Usually, the static tip-beam offset can be easily removed from the layers. However, other effects – such as charge buildup on the sample surface causing a shift of the e-beam spot from the tip during a longer measurement – might make this routine task quite challenging and time-consuming.

As a solution impulsed by these problems, CPEM Plus offers an extension of the CPEM technology using an AI-based algorithm that identifies and correlates matching features in two selected layers and adjusts the layers to fit. On the scheme below, you can see how the CPEM Plus upgrade works with the correlated images. You can choose the option of the Offset correction alone (first image) or both Offset and e-beam drift correction (second image). What about a practical example?

We can illustrate the functioning of CPEM Plus on a BiFe sample pictured below. The sample was measured by LiteScope and correlates the acquired AFM and SEM channels. The first image shows how the correlation looks without any adjustment, while the second image demonstrates how the offset and drift correction done by CPEM Plus works. As you can see, the CPEM Plus functionality assures an ultimate precision of correlation. As a result, it leads to an even bigger time-efficiency of sample analysis, removing the necessity of routine manual alignment of images.

Who wouldn't like to save the valuable time spent on routine tasks and simultaneously get better measurement results?