Advancements in graphene nanopatterning using focused electron-beam-induced etching

NenoVision

Researchers strive to unlock the potential of graphene, but precise manipulation remains challenging. In-situ experiments using the AFM-in-SEM LiteScope explore how electron-beam exposure affects SiO2 substrate morphology. Findings reveal subtle effects, guiding the optimization of nanopatterning processes for enhanced graphene-based device development.

Amazing work by the team led by Aleksandra Szkudlarek on graphene etching with water-assisted FEBIE!

We’re excited to see how LiteScope AFM-in-SEM supported their efforts by providing the necessary precision in analyzing topographical changes in SiO2 substrates. It’s always a pleasure to help researchers explore nanopatterning possibilities in graphene.

Their study reveals how electron beam parameters such as dwell time and dose can be fine-tuned to achieve controlled graphene etching, leading to improved nanotechnology applications.

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