Impact of Electron Irradiation on WS2 Nanotube Devices

We’d like to extend our congratulations to Martin Kovařík, Daniel Citterberg, Estácio Paiva de Araújo, Tomáš Šikola, and Miroslav Kolíbal from CEITEC for their outstanding work on the impact of electron beam exposure on WS2 nanotube-based FETs. 

We are glad that LiteScope AFM-in-SEM could support their research by providing the high-precision measurements needed for this groundbreaking study. It’s always rewarding to see our technology contribute to advancing scientific understanding.

In their study, the team observed significant and irreversible resistance changes in individual WS2 nanotubes after electron beam exposure with changes ranging from 2 to 14 times higher resistance. This effect was linked to substrate charging. Their findings underscore the importance of careful handling when working with nanostructures, especially those in contact with insulating materials exposed to electron beams during fabrication. This study provides critical insights into how electron irradiation can influence the properties of low-dimensional materials, which is essential for future device fabrication.

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